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Optical characterization of sputtered semitransparent zirconium nitride films
Uppsala Universitet.
Uppsala Universitet.
Uppsala Universitet.
1993 (English)In: Optical materials (Amsterdam), ISSN 0925-3467, Vol. 2, no 4, 257-266 p.Article in journal (Refereed) Published
Abstract [en]

Thin semi-transparent ZrN films have been prepared using reactive dc magnetron sputtering. The films had thickness from 11 to 43 nm and were grown on heated and room temperature glass substrates. The optical constants, N=n+ik, of the thin films have been determined with an RT inversion method in the wavelength interval 0.40 to 2.0 μm. The thickness of the films was determined from the photometric measurements. The optical properties of the thin films on glass were compared to opaque and thin ZrN films grown on single crystalline Si. The Drude parameters were calculated from the measured optical constants in the relaxation region of the thin films. The relaxation time, τ, of the thin films was found to increase with film thickness, substrate temperature and substrate crystallinity. The relaxation time is the mean free time for the electrons between collisions and a long relaxation time corresponds to a film with high optical quality. The observed decrease of τ with decreasing film thickness can be explained by the higher statistical probability of the electrons in a thin film to collide with the two surfaces of the film. Another explanation to the decrease of τ with film thickness is scattering from grain boundaries and lattice impurities. The higher optical quality of films grown on heated substrates is probably due to an increased grain size. The measured optical constants were compared with calculated optical constants, using the Drude model, and the optical behaviour of thin ZrN films was found to be well described by the screened free-electron model.

Place, publisher, year, edition, pages
1993. Vol. 2, no 4, 257-266 p.
National Category
Materials Engineering
Identifiers
URN: urn:nbn:se:fhs:diva-4528OAI: oai:DiVA.org:fhs-4528DiVA: diva2:708498
Available from: 2014-03-27 Created: 2014-03-27 Last updated: 2014-06-04Bibliographically approved
In thesis
1. Preparation and Characterisation of Sputtered Titanium- and Zirconium Nitride Optical Films
Open this publication in new window or tab >>Preparation and Characterisation of Sputtered Titanium- and Zirconium Nitride Optical Films
1993 (English)Licentiate thesis, comprehensive summary (Other academic)
Place, publisher, year, edition, pages
Uppsala: Uppsala universitet, 1993
National Category
Atom and Molecular Physics and Optics
Identifiers
urn:nbn:se:fhs:diva-4530 (URN)
Presentation
, Uppsala
Opponent
Supervisors
Available from: 2014-04-15 Created: 2014-03-27 Last updated: 2014-04-15Bibliographically approved

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